ID (ISN) del documento | 58732 |
Número CIS |
92-1694 |
ISSN - Título de la serie |
1047-322X - Applied Occupational and Environmental Hygiene |
Año |
1991 |
Número de serie |
|
Autor(es) |
Rosenthal F.S., Abdollahzadeh S. |
Título |
Assessment of extremely low frequency (ELF) electric and magnetic fields in microelectronics fabrication rooms |
Información bibliográfica |
Sep. 1991, Vol.6, No.9, p.777-784. Illus. 21 ref. |
Resumen |
Extremely low frequency (ELF) magnetic and electric fields were measured in four microelectronics fabrication rooms that utilised a variety of electrical devices. Magnetic field levels measured in the aisles of the workrooms ranged from 0.2-7.0mG; electric field levels ranged from 0.1-5.0V/m. At 2" (ca. 5cm) from the surfaces of various workroom devices, magnetic field levels ranged from 5.0-400mG; at 2ft (ca. 60cm) from the device surfaces, levels ranged from 0.5-70mG. From the measured levels and information obtained on typical work patterns, 8-hour time-weighted average personal exposures were estimated for various work scenarios. |
Descriptores (primarios) |
campos eléctricos; campos magnéticos; medida de la intensidad de campo; radiación no ionizante |
Descriptores (secundarios) |
lugares de trabajo; microelectrónica; valoración de la exposición |
Tipo de documento |
D - Artículos periódicos |
País / Estado o Provincia | Estados Unidos |
Tema(s) |
Radiaciones
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Broad subject area(s) |
Riesgos físicos
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Navegación por categoria(s) |
Electronics industry Electromagnetic fields Non-ionizing radiation Electricidad
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