| Document ID (ISN) | 62420 |
| CIS number |
94-933 |
| ISSN - Serial title |
0938-8303 - WLB - Wasser, Luft und Boden |
| Year |
1992 |
| Convention or series no. |
|
| Author(s) |
Reither K. |
| Title |
Gas cleaning in semiconductor production facilities |
| Original title |
Abluftreinigung bei Halbleiterproduktionen [in German] |
| Bibliographic information |
July-Aug. 1992, No.7-8, p.58-60. Illus. |
| Abstract |
Gaseous chlorine and hydrochloric acid are among the pollutants emitted in semiconductor production facilities. For cleaning the gases emitted by the various semiconductor production methods in use, gas absorption and adsorption are applied. The design of a gas cleaning system comprising two gas scrubbers (absorbers) and one activated-carbon adsorber is illustrated. Recommended safety features include monitors for the composition of the scrubbing fluids, their temperature and pressure. |
| Descriptors (primary) |
chlorine; hydrochloric acid; electronics industry; gas cleaning; gas scrubbers; gaseous effluents |
| Descriptors (secondary) |
air purification; adsorption; gas absorption; safety by design; design of equipment; absorption; gas adsorption |
| Document type |
D - Periodical articles |
| Country / State or Province | Germany |
| Subject(s) |
Heating, ventilation and climate
|
| Broad subject area(s) |
New technologies
|
| Browse category(ies) |
Inorganic substances
Halogens and their inorganic compounds
Electronics industry
Manufacturing of electrical appliances and equipment
|
