|Document ID (ISN)||61139|
|ISSN - Serial title
||0002-8894 - American Industrial Hygiene Association Journal
|Convention or series no.
||Sheehy J.W., Jones J.H.
||Assessment of arsenic exposures and controls in gallium arsenide production
||Feb. 1993, Vol.54, No.2, p.61-69. Illus. 13 ref.
||National Institute for Occupational Safety and Health (NIOSH) researchers conducted a study of control systems for electronics facilities using gallium arsenide. Three facilities which appeared to have effective controls were chosen for in-depth evaluation through industrial hygiene sampling. The following gallium arsenide processes were studied: Liquid Encapsulated Czochralski (LEC) and Horizontal Bridgeman (HB) crystal growing, LEC cleaning operations, ingot grinding/wafer sawing, and epitaxy. Results at one plant showed that in all processes except epitaxy, average arsenic exposures were at or above the Occupational Safety and Health Administration (OSHA) action level of 5µg/m3. While cleaning the LEC crystal pullers, the average potential arsenic exposure of the cleaning operators was 100 times the OSHA PEL. At the two other plants, personal arsenic exposures were well controlled in LEC, LEC cleaning, grinding/sawing, and epitaxy operations.
||arsenic; gallium arsenide; electronics industry; evaluation of control measures; limitation of exposure
||personal sampling; semiconductor devices; air sampling; survey; personal protective equipment; permissible levels
||D - Periodical articles
|Country / State or Province||USA|
||Toxic and dangerous substances
|Broad subject area(s)
Manufacturing of electrical appliances and equipment
Arsenic and compounds