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Document ID (ISN)61139
CIS number 93-1935
ISSN - Serial title 0002-8894 - American Industrial Hygiene Association Journal
Year 1993
Convention or series no.
Author(s) Sheehy J.W., Jones J.H.
Title Assessment of arsenic exposures and controls in gallium arsenide production
Bibliographic information Feb. 1993, Vol.54, No.2, p.61-69. Illus. 13 ref.
Abstract National Institute for Occupational Safety and Health (NIOSH) researchers conducted a study of control systems for electronics facilities using gallium arsenide. Three facilities which appeared to have effective controls were chosen for in-depth evaluation through industrial hygiene sampling. The following gallium arsenide processes were studied: Liquid Encapsulated Czochralski (LEC) and Horizontal Bridgeman (HB) crystal growing, LEC cleaning operations, ingot grinding/wafer sawing, and epitaxy. Results at one plant showed that in all processes except epitaxy, average arsenic exposures were at or above the Occupational Safety and Health Administration (OSHA) action level of 5µg/m3. While cleaning the LEC crystal pullers, the average potential arsenic exposure of the cleaning operators was 100 times the OSHA PEL. At the two other plants, personal arsenic exposures were well controlled in LEC, LEC cleaning, grinding/sawing, and epitaxy operations.
Descriptors (primary) arsenic; gallium arsenide; electronics industry; evaluation of control measures; limitation of exposure
Descriptors (secondary) personal sampling; semiconductor devices; air sampling; survey; personal protective equipment; permissible levels
Document type D - Periodical articles
Country / State or ProvinceUSA
Subject(s) Toxic and dangerous substances
Broad subject area(s) Chemical safety
Browse category(ies) Accident research
Inorganic substances
Electronics industry
Manufacturing of electrical appliances and equipment
Arsenic and compounds