| Document ID (ISN) | 49632 |
| CIS number |
88-981 |
| ISSN - Serial title |
0037-4512 - Sichere Arbeit |
| Year |
1987 |
| Convention or series no. |
|
| Author(s) |
Fischer G., Gränz A. |
| Title |
Atmospheric ionisation and radiation sources in production areas of a microchip factory |
| Original title |
Ionenklima und Strahlenquellen in Produktionsstätten eines Chip-Werkes [in German] |
| Bibliographic information |
Jan. 1987, Vol.40, No.1, p.13-16. 39 ref. |
| Abstract |
Although high-voltage ion implantation equipment and thickness meters were in use in production areas of a microchip manufacturing facility, monthly exposures of employees were around 5mrem, i.e. close to natural background levels and well below the 166mrem maximum allowable dose per year (in Austria) for members of the general population. No negative ions were detectable in the air of fully air-conditioned offices or clean rooms. Positive ions were detectable at all measuring points; the positive ion concentration in the room with the thickness meter rose several-fold when the device was in use. Even in non-air-conditioned offices, total ion levels were lower than in the open air. |
| Descriptors (primary) |
radiation equipment and processes; air-conditioned premises; microelectronics; clean rooms; electronics industry; atmospheric ionization |
| Descriptors (secondary) |
occupational health survey |
| Document type |
D - Periodical articles |
| Subject(s) |
Radiation
|
| Broad subject area(s) |
Physical hazards
|
| Browse category(ies) |
Manufacturing of electrical appliances and equipment
Heating and air conditioning
Electronics industry
|
